| Title: |
Pattern Analysis and Machine Intelligence
|
| GE Status: |
|
| U.S. History and Government: |
|
| Prerequisites: |
grades of C or better in CSC 510 and CSC 520 or consent of instructor.
|
| Term(s) Offered: |
|
| Units: |
(3)
|
| Description: |
Foundation of pattern analysis and machine intelligence. Artificial intelligence: agent, logic, search. Machine learning: Bayesian classification. Neural network: simulated annealing. Imaging: image
segmentation, object recognition.
|
| Effective: |
Summer 2007
|
| Latest Offering: |
Fall 2007
|
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