| Title: |
Apparel Design I: Flat Pattern
|
| GE Status: |
|
| U.S. History and Government: |
|
| Prerequisites: |
ADM 261. Priority enrollment given to ADM majors.
|
| Term(s) Offered: |
|
| Units: |
(3)
|
| Description: |
Trends in French and American fashion applied to the development of original designs by the flat pattern method. Development of basic pattern and fitting problems. Classwork, 2 units; laboratory, 1
unit. Extra fee required. (Formerly CFS 362.) Priority enrollment for ADM majors.
|
| Effective: |
Summer 2003
|
| Latest Offering: |
Fall 2007
|
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